Dioxide ( TiO 2 ) using Poly ( methyl methacrylate ) ( PMMA )
نویسنده
چکیده
The Minnesota Nano Center’s Keller Hall facility includes an atomic layer deposition (ALD) machine that is capable of depositing uniform alumina (Al2O3), hafnium oxide (HfO2), silicon dioxide (SiO2), zinc oxide (ZnO), and titanium dioxide (TiO2). ALD works by building alternate layers on a film using two different precursor gases – one usually supplying the metallic atoms and water vapor (H2O) usually supplying the oxygen atoms.
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